Frost & Sullivan last month recognized MEMSIC, Inc., as its recipient of the 2016 North American Technology Innovation award. According to Frost & Sullivan, by investing in innovative and effective processes, design and manufacturing capabilities, MEMSIC has positioned anisotropic magnetoresistance (AMR) sensor technology to take market share away from Hall sensors.
Compared to Hall magnetic sensors, AMR sensors provide technical advantages, explains Frost & Sullivan, such as a wider air gap; more sensitivity, particularly at room temperature; better immunity to vibrations; and the ability to consume less power.
“In competing with Hall sensors, AMR sensors face the challenge of achieving cost reduction while also optimizing the performance and minimizing the size of AMR sensors,” said Peter Adrian, Frost & Sullivan, principal analyst and research manager of the TechVision Division. “MEMSIC’s AMR sensors are available at the same cost or less than Hall sensors, while also offering higher bandwidth, higher dynamic range and sensitivity and lower power consumption.”
MEMSIC can provide a single-chip solution that integrates a 3-axis AMR sensor and integrated signal conditioning, created using wafer-level packaging. Frost & Sullivan says such a solution is more compact and cost effective than combo sensors that use separate chips. The technology offers an extended magnetic field range of 100 gauss, even when measurements occur at a 45-degree angle, which allows AMR sensors to be used beyond low-field applications.
MEMSIC’s AMR sensors are already implemented in consumer electronics, such as smartphones and tablets. The company is striving to expand into diverse applications such as current sensors for applications, including servers, motor control, solar inverters, power supplies and smart traffic control.
Each year, Frost & Sullivan presents this award to the company that has demonstrated uniqueness in developing and leveraging new technologies that significantly impact both the functionality and the customer value of the new products and applications.